High- and Low-Temperature Chamber HDK S1

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High- and Low-Temperature Chamber HDK S1

Description

XRD chamber for operation in well-defined atmospheres (e.g. inert gas, N2, air,
oxidative mixtures up to 1 bar) or in high vacuum down to 10-5 mbar

•   Temperature range: ambient temperature to 1600°C (standard);
    -185°C to + 400°C (with low temperature option)
•   Sample adjusting device for vertical adjustment of the sample, +1/-9 mm
•   Automatic compensation of the thermal expansion of the sample carrier
•   Chamber cooling: chamber body air-cooled; base plate and electrodes water-cooled

 

•   Option:
    Ni-plated chamber body made of brass for aggressive atmospheres or samples

•   Front plate of HDK S1 chamber removable to mount low temperature option
•   Cold stage: gold-plated copper block cooled down by liquid nitrogen 
    and heated by special heating filament
    Temperature control: via NiCrNi (type K) thermocouples

Details

Temperature range: ambient to 1600°C (standard); -185°C to + 400°C (low temperature option)
Atmospheres: high vacuum, inert gas, N2, air, oxidative mixtures
X-ray window: Kapton foil (standard), 0° < 20 < 180°; beryllium window (option), 0° < 20 < 180°
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